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Lecture Details :
Lecture 2: Semiconductor process variation
Instructor: Duane Boning, David Hardt
View the complete course at: http://ocw.mit.edu/2-830JS08
License: Creative Commons BY-NC-SA
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Course Description :
The objective of this subject is to understand the nature of manufacturing process variation and the methods for its control. First, a general process model for control is developed to understand the limitations a specific process places on the type of control used. A general model for process variation is presented and three methods are developed to minimize variations: Statistical Process Control, Process Optimization and in-process Feedback Control. These are considered in a hierarchy of cost-performance tradeoffs, where performance is based on changes in process capability.
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